4. CD-SEM - What is a Critical Dimension SEM?
A Critical Dimension SEM (CD-SEM: Critical Dimension Scanning Electron Microscope) is a dedicated system for measuring the dimensions of the fine patterns formed on a semiconductor wafer. CD-SEM is mainly used in the manufacturing lines of electronic devices of semiconductors.
CD-SEM: Critical-Dimension Scanning Electron Microscope
CD-SEM, or critical-dimension scanning electron microscope, is a tool for measuring feature dimensions on a photomask. A scanning electron microscope, or SEM, takes measurements by sending out an electron beam, which interacts with electrons in the material being scanned.
VeritySEM ® 6C Critical Dimension (CD) Metrology - Applied …
A CD-SEM (critical dimension scanning electron microscope) that is versatile in wafer handling and measurements can be tailored for compound semiconductors and address the varying degree of metrology and is essential for a reliable high productivity process control.
Critical Dimension Scanning Electron Microscopy (CD-SEM
Critical Dimension Scanning Electron Microscopy (CD-SEM) is a specialized technique used for high-resolution imaging and precise measurement of nanoscale structures in semiconductor manufacturing and other nanotechnology applications.
VeritySEM ® 10 Critical Dimension (CD) Metrology - Applied …
The Applied VeritySEM ® 10 CD-SEM metrology platform is specifically designed to measure the critical dimensions of features patterned with EUV and high-NA EUV. The system uses industry-leading sub-nanometer eBeam resolution to quickly capture between 13 and 36 precise CD measurements across the wafer.
CD-SEMs (critical dimension measurement scanning electron microscopes) are used in the semiconductor production process to measure properties of wafer circuit patterns such as line width and hole diameter.
CD-SEM is non-destructive and provides top-down, two-dimension-al measurements. Cross sectional SEM (XSEM) can provide three-dimensional information, but at the cost of addition-al, destructive sample preparation.
Metrology Solution : Hitachi High-Tech Corporation
Metrology Solution. High-Precision Electron Beam Metrology System GT2000. CD-SEM to meet the needs of semiconductor devices development and mass production in High-NA EUV generation. For the EUV era device production – High Reliability CD-SEM.
CDSEM (Critical-Dimension-SEM)
CD-SEM is a tool used for i) Measuring the lines and holes and other fine feature patterns produced on semiconductor wafers. [2] Those are obtained by deriving a critical dimension (CD) from a pair of parallel edges extracted from the images.
Metrology Solution : Hitachi High-Tech in the U.S.A.
CD-SEM to meet the needs of semiconductor devices development and mass production in High-NA EUV generation. For the EUV era device production – High Reliability CD-SEM. A sustainable CD measurement solution to a wide range of 4, 6, and 8 inch wafer Fabs.