Photoresist - an overview | ScienceDirect Topics
Photoresist is a mixture of light-sensitive liquid composed of photosensitive resin, sensitizer and solvent. After illumination, the photoinitiator in the photoresist absorbs photons and generates …
This chapter describes the basic chemical composition and the resulting chemical and physical properties of the AZ® and TI photoresists marketed by us with a focus on the suitability and …
1. What are photoresists composed of, and how do they work?
Photoresists (also photo coatings) are primarily used in micro electronics and micro system technologies for the production of µm- and sub-µm structures.
Photoresists - DuPont
From our i-line/g-line, to our 193 and KrF product families, DuPont has photoresists to match your needs. When combined with DuPont’s etching, developing and ancillary products, you get a …
Patterning the World: The Rise of Chemically Amplified Photoresists
Oct 3, 2007 · An entirely new breed of photoresist—chemically amplified (CA) photoresists—created within IBM in the early 1980s for just this purpose would eventually …
Polymeric materials have found use in the electronics industry in …
Modern photoresists are polymeric materials that are modifi ed when exposed to radiation (either in the form of visible, ultraviolet, or X – ray photons or in the form of energetic electron beams). …
Photoresist - an overview | ScienceDirect Topics
Photoresist, a light-sensitive compound, is exposed to UV light through a patterned photomask to generate patterns onto various substrates, such as silicon, glass, and gold. Photoresist comes …
Some developers (e. g. AZ® 400K, AZ® 351B) contain chemical buffers, which suppress the reduction of the pH-value by CO2-absorption and enable a constant development rate over a …
Photoresist - an overview | ScienceDirect Topics
Photoresists are polymeric materials that transfer micro- and nanoscale patterns to a substrate through a radiation-induced solubility change. Both electron beam and deep ultraviolet …
based photoresists tend to have low density and need to have enough thickness to effectively protect the underlying substrate from etching and ion implantation.
- Some results have been removed