Lenses & mirrors - Lithography principles - ASML
We developed immersion lithography, which allows chipmakers to print even smaller features with the same wavelength of light by projecting the light through a layer of water between the lens …
See results only from asml.comHow immersion lithography …
The team narrowed the solution space enough to identify a basic engineering …
How immersion lithography saved Moore’s Law – Stories | ASML
Aug 2, 2023 · The team narrowed the solution space enough to identify a basic engineering mechanism: dubbed the 'immersion hood,' this new part of the lithography system formed a …
TWINSCAN NXT:1980Di - DUV lithography systems
The TWINSCAN NXT:1980Di includes a 1.35 NA 193 nm catadioptric projection lens that can achieve production resolutions down to 40 nm (C-quad) and 38 nm (dipole) and an in-line design supporting full 26 x 33 mm field size, 4X …
Working with Carl Zeiss, a new catadioptric lens design was developed, which combines refractive components with mirrors to create a hyper-NA lens that is cost effective to …
To support your aggressive shrink roadmaps, ASML is launching the TWINSCAN XT:1900Gi. This fifth-generation immersion lithography system has an industry-high NA of 1.35, enabling …
A Deep Dive into Immersion Lithography Technology
Oct 26, 2022 · Immersion lithography improves lithography resolution by increasing the NA, or "numerical aperture". It goes from a previous maximum of 0.93 to 1.35 or higher - collecting and focusing more light. Immersion …
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Immersion lithography with an ultrahigh-NA in-line …
Apr 1, 2006 · Here, we propose a novel method to control the shape of the immersion lens by applying Marangoni stress using volatile vapor.
SMASH Reuse Capture Information in Stage Alignments: Coarse capture scans are done on all stage alignment marks. Parameter indicates how long overlay data will be stored.s: Short …
TWINSCAN NXT:2050i - DUV lithography machines
The TWINSCAN NXT:2050i is a high-productivity, dual-stage immersion lithography tool designed for volume production of 300 mm wafers at advanced nodes. Built on the future-proof NXT4 platform, our TWINSCAN NXT:2050i …
Chip Making’s Wet New World - IEEE Spectrum
Apr 30, 2004 · Though it sounds straightforward, the big change in 193-nm immersion lithography—putting water between the projection lens and the wafer—is the major challenge.
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